The Physical vapor deposition reference article from the English Wikipedia on 24-Apr-2004 (provided by Fixed Reference: snapshots of Wikipedia from wikipedia.org)

Physical vapor deposition

Physical vapor deposition (PVD) is a technique in semiconductor device fabrication used deposit thin films of various materials onto various surfaces (e.g., of semiconductor wafers) by physical means, as compared to chemical vapor deposition.

Variants of PVD include

• Evaporative deposition
• Sputtering

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